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(1)

Departement of Information Technology and Media

Sensor Technology

1

Sensor Technology group

• Read-out Electronics for Pixel Detectors

• Establishment of Experimental Research

Infrastructure

(2)

• Introduction

– Purpose

• Establishment of experimental research infrastructure in processing of semiconductor radiation detectors

• Educate undergraduate and graduate student in basic semiconductor processing

• Support the simulation group with samples-test structures for measuring different kind of semiconductor parameters

– Requirement

• The equipment in the clean room must be easy to use and be as flexible as possible

• The equipment must handle small pieces, to wafers with a diameter of 100mm

• The most common processing steps must be represented

Establishment of Experimental

Research Infrastructure

(3)

Departement of Information Technology and Media

Sensor Technology

3

Overview of the cleanroom

(4)

Outside the cleanroom

• Infrastructure

– Gas store rooms

– Storage for chemicals – Deionised Water

– Ventilation

•Control of:

• Particles

• Temperature

• Humidity

• Exhaust

– Drainage of acids and solvents – Vacuum (for wafer chuck)

– Cooling water

– Compressed air

(5)

Departement of Information Technology and Media

Sensor Technology

5

Inside the cleanroom

• Change to cleanroom

clothes • Measurement laboratory

(6)

• Dry etch (RIE)

– Electrode distance – Etching chemistry

• SF6, CH4, CHF3

– Pressure – Bias

– Power

Tegal 903e

Tegal 901e

(7)

Departement of Information Technology and Media

Sensor Technology

7

• Furnaces

– Diffusion from solid sources

• Boron

• Phosphorus

– Growth of silicondioxide

•dry

• wet (pyrogenic)

– Annealing

•FGA N2/H2

•in N2 or O2 ambient

(8)

• Wet etching

• Cleaning

• R/D

• Anisotropic wet etch

(9)

Departement of Information Technology and Media

Sensor Technology

9

• Lithographic Processes

– Mask aligner

•Soft contact

•Proximity

– Plasma stripper – Development bench – Softbake furnace – Hardbake furnace – Hotplate

– Spinner

– HMDS furnace

– Place for maskgenerator

(10)

• Implantation

– Varian DF4

•Energy 10 keV-200 keV

•BF3 (gas)

•Arsenic (Solid)

•Phosphorus (Solid)

(11)

Departement of Information Technology and Media

Sensor Technology

11

• Metallization

– Sputter

– Electron beam evaporator

(to be

delivered in august)

•Six pocket crucible

•High voltage power supply fully semiconductor equipped

(12)

• Education

– Course in “Vacuum Technology for Semiconductor Processing” (Given by Doc. Lars Westerberg, chairmen in Swedish Vacuum Society)

•Lectures

•Laboratory exercise

•Study visit at The Svedberg laboratory in Uppsala

• Planned Project

– Pixel detector in silicon – Integrated E-E detector in

silicon

– UV-detector in silicon with two layers antireflective coating

– Test structures in SiC

– Laboratory exercise for the students in the processing of pn-diodes

• Recruit of PHD students to work in semiconductor

processing

References

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